Electrostatic Beam Blanker

One of the best

With rise time values <100 picoseconds, this beam blanker is ideally suited to the fast stroboscopic imaging required in voltage contrast, EBIC, OBIC, time-resolved cathodoluminescence and electron-beam lithography

Key Features
- Speed - This beam blanker has been optimised to achieve the shortest possible "rise time" values and is the result of several years of development. A guarantee of 100 picoseconds rise time is included however data has shown figures between 35 to 50 picoseconds is consistently measured
- Pulse distortions - Assuming good input pulses, pulse frequencies up to the GHz range have been found to be clean and square. With very short plates (5.5 mm), and only 5 V input pulses required to sufficiently blank a 40 KeV beam, flying-time effects are below the level of any detection method
- Flexible - Able to be fitted to almost any SEM on the market with custom adaptation kits available if required.

Related Products

All
AFM/SPM/SNOM
CL
CLEM
EBSD
EDS
Electron Beam Lithography (EBL)
Electron Microscopy
Fabrication
FIB
Hyperspectral
In situ
Micro XRF
Microscopy
Raman
SEM
Spectroscopy
TEM
Thermal Probe Lithography
WDS

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