TESCAN SOLARIS

Highest quality TEM lamella preparation and a superior analytical performance

Advanced nanofabrication system coupling UHR SEM column and best resolution Ga FIB column

Key Features
- Novel Orage™ Ga FIB column Ultra-high resolution Ga FIB column with excellent performance throughout the entire range of ion beam currents and full energy range down to 500 eV
- Next generation Essence™ SW user interface Application-oriented, fully customisable and user-friendly layout
- World's largest FIB and SEM Field of views Unmatched FIB Field of View: 1 mm at 30 keV
- Smart and unique Triglav detection system Multi-detector system consisting of TriSE™ and TriBE™ enables collection of SE and BSE in the entire take-off angle range for maximum information of the sample
- Smart and patented In-Flight Beam Tracing™ Adaptive spot shape optimisation for better performance at high currents
- High FIB currents and SmartMill strategy Up to 100 nA for fast large-volume milling and SmartMill strategy slash by half the time for completing your cross-sectioning and lamellae lift-out processes
- New single gas injection system OptiGIS Fast run up time and excellent stability of the deposition/etching rate. Up to 6 OptiGIS units are possible in one instrument
- EquiPower™ lens technology Efficient thermal power dissipation and excellent electron column stability

Analysis of Optical Fibres Using FIB-SEM and ToF-SIMS

The elemental analysis of doping elements distribution in optical fiber cross-sections requires a sensitive high spatial resolution like TOF-SIMS.

Ga FIB TEM Sample Preparation from 10nm FinFET

Ga FIB TEM Sample Preparation from 10nm FinFET

All
AFM/SPM/SNOM
CL
Diffraction Imaging
EBSD
EDS
Electron Beam Lithography (EBL)
Electron Microscopy
Fabrication
FIB
In situ
Microscopy
SEM
TEM
Thermal Probe Lithography
WDS

UHV FIB-SEM NanoSpace

UHV FIB-SEM NanoSpace

AFM/SPM/SNOMCLEDSElectron MicroscopyFabricationFIBSEMWDS

A versatile platform ideally suited to FIB-SEM applications in an UHV and contamination free environment

TESCAN SOLARIS X - Xe Plasma FIB-SEM for Semiconductors

TESCAN SOLARIS X - Xe Plasma FIB-SEM for Semiconductors

EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBMicroscopySEMTEMWDS

Xe plasma FIB-SEM for Semiconductors

Eucentric Five Axis Table

Eucentric Five Axis Table

EDSFIBSEM

The E5AT stage is a five-axis positioning tool especially designed to allow tilting samples to ±90 deg while allowing unlimited rotation of the sample and keeping the area of interest at the eucentric position.

Model 1051 TEM Mill

Model 1051 TEM Mill

Diffraction ImagingFIBTEM

Table top precision preparation for producing high quality TEM samples for a wide variety of applications

Model 1080 PicoMill

Model 1080 PicoMill

Diffraction ImagingFIBTEM

The FIB is highly effective in preparing TEM specimens, but the use of a high-energy, liquid metal ion source can often result in specimen amorphization, gallium implantation, or both. Let the FIB do what the FIB does best; let the PicoMill system do the rest

Cryo Module 80 Kelvin

Cryo Module 80 Kelvin

Electron MicroscopyFIBIn situSEM

An extremely low vibration level cryo module that runs on liquid nitrogen, adding new capabilities to your SEM

Transfer Module

Transfer Module

Electron MicroscopyFIBIn situSEM

Made for the purpose of carrying delicate and sensitive specimens in a capsule from the SEM into a glove box, or vice versa, to ensure they are protected from air or moisture at all times.

Anti Curtaining Table

Anti Curtaining Table

FIB

A four-axis positioning tool especially designed to allow rocking a sample while observing it with both the electron and ion beams. It provides an additional tilt axis that is
perpendicular to the FIB-SEM’s stage’s tilt axis allowing for rocking of the sample back and forth on an axis that is perpendicular to the focussed ion beam

Model 1040 NanoMill

Model 1040 NanoMill

Diffraction ImagingElectron MicroscopyFIBTEM

The NanoMill system is the ultimate companion for your FIB to optimise TEM specimen preparation quality

TESCAN AMBER 2 - Ga FIB-SEM

TESCAN AMBER 2 - Ga FIB-SEM

EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBIn situMicroscopySEMTEMThermal Probe Lithography

The most versatile and universal analytical Ga FIB-SEM platform on the market

TESCAN AMBER X 2 - Plasma FIB-SEM

TESCAN AMBER X 2 - Plasma FIB-SEM

EBSDEDSElectron Beam Lithography (EBL)Electron MicroscopyFabricationFIBIn situMicroscopySEMTEMThermal Probe Lithography

Combining the speed of a plasma FIB with the resolution of a Ga FIB

MM3E Micromanipulator

MM3E Micromanipulator

Electron MicroscopyFIBIn situSEM

Adding capabilities from in situ lift-out, electrical probing (FA)and nano-manipulation, the encoded MM3E micro-manipulator brings new functionality to your SEM or FIB/SEM instrument

NanoWorkstation

NanoWorkstation

FIBIn situSEM

The NanoWorkstation is a powerful, dedicated system that allows physical manipulation and characterisation at the micro and nano-scale with ease adding new capabilities to your SEM or FIB/SEM instrument.

ProbeWorkstation for Electrical Characterisation of Semiconductors

ProbeWorkstation for Electrical Characterisation of Semiconductors

FIBIn situSEM

The ProbeWorkstation is a powerful, dedicated system for electrical characterisation of semiconductor devices and advanced materials in SEM and FIB. The optimal combination of our market-leading nano-manipulation and probing products provide a versatile, integrated solution for failure analysis and R&D applications requiring stable, low-current measurements.